The development, fundamental principles and applications of the magnetron. The main line of development of magnetron sputtering up to the present time has been associated with the transition to planar magnetron sputtering systems in the 70s of the past century. For a330 and a340 magnetic material sources configured with the reverse clamping ring, screw in the. Us6146509a inverted field circular magnetron sputtering. Penning 1 in 1935 and patented in several countries. Epitaxial yba 2 cu 1x zn x 3 o 7delta thin films were prepared by an inverted cylindrical magnetron sputtering technique.
Recent developments in inverted cylindrical magnetron. Nanocrystalline gamma alumina coatings by inverted. Magnetron sputtering overview angstrom engineering. Pvd vacuum surface coating technique magnetron sputtering as this is the most widely used pvd relevanttoadsense typestartthin film coatingrelevanttoadsense typestop technique as it is suitable for that is many applications however the basics of arc evaporation and pulsed laser ablation can be viewed by clicking the links. Information and data in this manual are subject to periodic amendments.
What is thin film deposition by thermal evaporation. The surface morphology of the films was studied by scanning electron microscopy. There is much more to designing a worldclass magnetron than simply strapping some magnets into a watercooled cavity and hoping for the best. Main specifications of reactive sputtering in an inverted cylindrical magnetron icm 07042016 phd. Selfsputtering of an inverted cylindrical magnetron for ion. Unlike dualcathode midfrequency sputtering with two planar magnetrons. Pdf this overview article will deal with a special application of the sputtering. Therefore, we have built a dualcathode inverted cylindrical magnetron that can be driven with midfrequency power.
Us6761804b2 us10074,855 us7485502a us6761804b2 us 6761804 b2 us6761804 b2 us 6761804b2 us 7485502 a us7485502 a us 7485502a us 6761804 b2 us6761804 b2 us 6761804b2 authority us united states prior art keywords cathode deposition material shaped source interior prior art date 20020211 legal status the legal status is an assumption and is not. At the total pressure of 40 pa epitaxial ybco thin films with good superconducting transition properties and smooth surface were prepared by the magnetron sour. Magnetron sputtering has become the process of choice for the deposition of a wide range of. In addition, combining dual cathode mid frequency unbalanced magnetron sputtering with the cylindrical geometry produces a unique source for ion enhanced. Pdf thermochromic vo2 thin films synthesized by rfinverted. The magnetron is electrically arranged as an inverted magnetron source in which the discharge is sustained using the positive driving voltage. Aug 01, 2014 the shape of inverted cylindrical magnetrons makes them ideal for coating a variety of optical components having non. The surface of the target is eroded by highenergy ions within the plasma, and the liberated atoms travel through the vacuum environment and deposit onto a substrate. The role of energetic ion bombardment during growth of tio2. Sputter deposition is a widely used technique to deposit thin films on substrates. High power pulsed reactive sputtering of zirconium oxide and. Hipims, magnetron sputtering, coaxial double magnetron, sideways deposition, cylindrical. The 903 vacuum gauge has a second feedthrough for ion collection, ensuring accurate reading results. In addition, combining dual cathode mid frequency unbalanced magnetron sputtering with the cylindrical geometry produces a unique source for ion enhanced deposition on planar substrates located at the ends of the.
For verified definitions visit all trademarksservice marks referenced on this site are properties of their respective owners. By roll to roll inverted cylindrical magnetron sputtering there is a huge demand in functional textile product by the advent of nanotechnology and thin film technology. Magnetron sputtering source data sheet specifications. Recent developments in inverted cylindrical magnetron sputtering. Thermochromic nanocrystalline auvo composite thin films. Nov 26, 2016 dc sputtering is the most basic and inexpensive type of sputtering for pvd metal deposition and electrically conductive target coating materials. Furthermore, the special concept of magnetron sputtering, from both a.
The sputtering system used for our experiments, the icm10 made by isoflux inc. Hardness and frictional properties of alumina coatings by ac. Design and characterization of a synchronous coaxial. Htsc thin film growth by inverted cylindrical magnetron. Optimization of magnetron sputterdeposition process of thin. Design, construction, and optimization of a magnetron sputtering. Using the inverted magnetron design principle, the 903 inverted magnetron cold cathode vacuum transducer can operate at pressures much lower than a traditional cold cathode vacuum sensor. Design, construction, and optimization of a magnetron. It is a low cost potential coating technology for the production of large area uniform nanocomposite thin films exhibiting plasmonic properties. Rf magnetron sputtering is available in a variety of source configurations and compatible with many of angstroms process control capabilities and advanced fixturing options. Inverted cylindrical magnetron sputtering glocker 2014. This paper describes the operation of an inverted cylindrical magnetron consisting of two coaxial targets in a common magnetic field, as described by penfold and thornton. Lawrence berkeley national laboratory escholarship. High power impulse magnetron sputtering hipims is a novel pulsed power technique.
Jul, 2004 the chamber 100 includes an inverted magnetron sputtering source 102 having a cathode 104 which, as best seen in figs. Arnell centre for advanced materials and surface engineering, university of salford, salford m5 4wt, uk received 20 september 1999 abstract magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important. Icms inverted cylindrical magnetron sputtering acronymattic. Cylindrical magnetron sputtering cathodes are described in a series of patents by penfold and thornton issued in the mid1970s and were among the first magnetrons developed. Thermochromic vo2 thin films synthesized by rf inverted cylindrical magnetron sputtering. A magnetron sputtering system was designed and constructed in accordance with the.
For a simple planar magnetic system, a planar cathode is backed by permanent magnets that provide a toroidal field with field lines forming a closed path over the target cathode surface. In another coniguration the cylinder is made the cathode while the post or end plates is the anode inverted or hollowcathode magnetron. The magnetron mainly consisted of a 410grade stainlesssteel anode and a gappednickel cathode. Engineered optical and electrical performance of rfsputtered. They sputter from the surface of approximately cylindrical targets and can be built in either the post or inverted geometry to sputter off of the outside or inside of the. Midfrequency ac reactive sputtering of dual cylindrical targets has been reported earlier by glocker et al. Mgyni1yhx thin films deposited by magnetron co sputtering. Inverted cylindrical magnetron sputtering request pdf. Deposition of alumina films by inverted cylindrical magnetron. Film thickness distribution in magnetron sputtering.
Such kind of metal ion source based on a planar magnetron has been reported in our previous, recent publication. A magnetron sputtering system was designed and constructed in accordance with the nuclear energy research initiative for consortia neric project on the. Xray diffraction shows an epitaxial growth with the c axis perpendicular to the substrate surface. Pdf nanocrystalline gamma alumina coatings by inverted. Request pdf inverted cylindrical magnetron sputtering the shape of inverted cylindrical magnetrons makes them ideal for coating a variety of optical. The effect of deposition power and oxygen partial pressure on the hardness and frictional performances of the alumina coatings were investigated using a nanoindenter.
The structure of the inverted magnetron has been provided in detail elsewhere 9. Magnetron sputtered yba2cu3xmxo703b4 study microscopy. Magnetron sputtering is a mature, widely used deposition technology for. A comparative study of ybco thin film growth by inverted. Plasma free fulltext an inverted magnetron operating in. Sputter deposition reactive sputtering dielectric coatings high power pulsed magnetron sputtering experiment the inverted cylindrical magnetron used in these experiments is shown in figure 1 and has been described elsewhere 10. Pdf thermochromic vo2 thin films synthesized by rf. Film thickness distribution in magnetron sputtering s swarm, edwards high vacuum international, manor royal, crawley, w. Magnetron sputter deposition the society of vacuum coaters. In this paper we report the growth and characterization of alumina coatings prepared by inverted cylindrical magnetron sputtering at a frequency of 41 khz and power of 5 kw. Two major advantages of dc as a power source for this process is that it is easy to control and is a low cost option if you are doing metal deposition for coating. This configuration could provide a large flux of energetic ions, assisting the thin film process.
Aeres, angstroms advanced process control software, has been specifically configured with features and capabilities unique to high performance rf magnetron sputter. Properties of epitaxial yba2cu1xznx3o7 thin films prepared. Recent citations antireflection tio 2 coatings on textured surface grown by hipims jevgenij vi niakov et alplasma synthesis of photocatalytic tio x thin films l sirghia parametric model for reactive highpower impulse magnetron sputtering of films. It is a compact source with no moving mechanical parts. Magnetron sputtering is a magnetically enhanced sputtering technique discovered by penning and subsequently developed. They sputter from the surface of approximately cylindrical targets and can be built in either the post or inverted geometry to sputter off of the outside or inside of the target, respectively. Sussex, uk of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film. Nanocrystalline gamma alumina coatings by inverted cylindrical magnetron sputtering. Thermochromic vo2 thin films synthesized by rfinverted cylindrical magnetron sputtering.
An inverted magnetron operating in hipims mode mdpi. High power impulse magnetron sputtering hipims is now a wellestablished technique to generate large ion fluxes of sputtered particles 10. The magnetron sputtering processes allow the deposition of metals, alloys, ceramic, and polymer thin films onto a wide range of substrate materials. An inverted field circular planar magnetron sputtering device is described that produces coatings with a high degree of thickness uniformity on round waferlike substrates. Experimental analysis of plasma conditions in an inverted. However, a schematic diagram showing the arrangement of the magnetron used in the present work is shown in figure1a. Enhanced efficiency of inverted polymer solar cells using two. Ac reactive sputtering with inverted cylindrical magnetrons. Experimental pure, zn and fedoped epitaxial yba2cu3o703b4 thin films were grown in situ on single crystal 100 srti03 and 100 mgo substrates using inverted cylindrical magnetron sputtering. Mar 23, 2009 alumina thin film coatings of 500 nm thickness were deposited on silicon substrates by ac inverted magnetron sputtering technique at 350c. Isoflux is recognized as the worlds leading manufacturer of inverted cylindrical magnetron sputtering cathodes. Inverted cylindrical magnetron sputtering, vakuum in.
Performance of actinidecontaining fuel matrices under extreme radiation and temperature environments the system will initially be used to produce urania uo 2. Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited the target. The present paper describes the special features observed for the selfsputtering mode of an inverted cylindrical magnetron configuration formed by two coaxial cylindrical electrodes. Within the frame of this work, the recent developments of reactive magnetron sputtering technique are presented. Geometry of the inverted cylindrical magnetron cathode used in these experiments. The sputtering source 102 further includes an anode 106 which, in the illustrated embodiment, is a generally ringshaped rod positioned in the interior 110 of the hollow. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. The present paper describes the special features observed for the self sputtering mode of an inverted cylindrical magnetron configuration formed by two coaxial cylindrical electrodes. Antistatic and antibacterial textile materials are highly required in medical centers, clean rooms, military basis and electronic device manufacturers. Greene 2 1 ghent university, department of solid state sciences, krijgslaan 281 s1, 9000 ghent, belgium 2 materials science and physics departments and the frederick seitz materials. This paper reports the synthesis and feasibility of reliably reproduced high quality of auvo2 by icms. Frg 700702 pirani inverted magnetron gauge the agilent frg700 gauge is a full range gauge that provides two measuring technologies in a single, compact and economical package to measure process and base pressure from 5 x 10 9 mbar to atmosphere 3. High power pulsed reactive sputtering of zirconium oxide.
Substrate and sputter target positions are inverted as compared to. The plasma parameters and reaction kinetics in an inverted cylindrical magnetron chamber have been studied with an energy resolved mass spectrometer during the sputtering of aluminum targets in an. Inverted cylindrical magnetron cathodes sputter from the interior surfaces of cylindrical targets and simultaneously deposit material on all sides of threedimensional substrates. The socalled magnetron sputtering technique has been used as a coating method.
Over 3 million unverified definitions of abbreviations and acronyms in acronym attic. An inverted magnetron operating in a high power impulse magnetron sputtering hipims mode was proposed. The shape of inverted cylindrical magnetrons makes them ideal for coating a variety of optical components having non. Dc signals applied to low power electromagnetic coils provide control of the coating thickness uniformity throughout the life of the target.
543 916 1196 1006 517 525 40 929 31 26 469 1488 1236 1127 27 1132 220 1149 580 1285 1179 1430 1189 1024 553 1004 186 838 1213 546 84 85 1416 136 471 482 28 678 557 476 596 945 674 948